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The company showcased its self-developed chemical vapor deposition equipment at the SEMI exhibition.

2025-04-10

SEMICON China 2025 opened successfully at the Shanghai New International Expo Center on March 26. As a "leader" in chemical vapor deposition equipment, Shanxi China Electronics Corporation showcased its self-developed chemical vapor deposition equipment at the SEMI exhibition and gave a keynote speech on "SiC CVD Equipment Technology and Application for Semiconductors," comprehensively introducing the company's strong capabilities in the field of chemical vapor deposition equipment.

On March 26, SEMICON China 2025 successfully opened at the Shanghai New International Expo Center. As a "leader" in chemical vapor deposition equipment, Shanxi China Electronics Corporation showcased its self-developed chemical vapor deposition equipment at the SEMI exhibition and gave a keynote speech titled "SiC CVD Equipment Technology and Application for Semiconductors," comprehensively introducing the company's strong capabilities in the field of chemical vapor deposition equipment.

 

 

SiC CVD equipment is a key device for preparing coatings of semiconductor core components. It introduces precursors into the reaction chamber through bubbling or evaporation, precisely controlling pressure/temperature/gas ratio, and performing CVD on graphite or silicon carbide surfaces. Tian Donglong, a distinguished young scientist of China Electronics Technology Group Corporation, equipment technology expert, and senior engineer of the company, systematically introduced the development prospects of SiC CVD in his speech. By precisely locating the pain points of the core structure and using advanced technical means to solve these problems, he detailed the design key points of the core structure of SiC CVD equipment and gave a comprehensive interpretation of the various process indicators of the company's coating products. In recent years, the company has been deeply engaged in the R&D of SiC CVD equipment, innovatively optimizing and upgrading the core structures, including the deposition chamber, heating and insulation system, gas inlet system, vacuum system, exhaust gas treatment system, and intelligent control system, achieving continuous iteration and updating of equipment, processes, and services. The equipment performance, process adaptability, and stability have been significantly improved, fully meeting mass production needs.

 

 

Looking to the future, Shanxi China Electronics Corporation will always adhere to the development concept of "equipment + process + service" and the development model of "advanced processes promote equipment development, and equipment iteration improves process technology." It will continue to cultivate the semiconductor equipment field, driven by technological innovation, to contribute more to China's semiconductor industry chain.

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