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Major breakthrough achieved in 2000℃ pyrolytic graphite coating technology!

2025-06-30

Recently, the company achieved a major technological breakthrough in the field of 2000℃ pyrolytic graphite coating equipment and processes, successfully completing the equipment development and process validation for coating 8-inch silicon wafer flow tubes!

Recently, the company achieved a major technological breakthrough in the field of 2000℃ pyrolytic graphite coating equipment and processes, successfully completing the equipment development and process validation for the coating of 8-inch silicon wafer flow guide tubes!

The newly developed coating for the 8-inch silicon wafer flow guide tube realizes directional deposition of pyrolytic graphite at a high temperature of 2000℃, forming a coating with uniform thickness and strong adhesion. The coating thickness uniformity reaches 45±5μm. This coating not only significantly improves the thermal conductivity and thermal shock resistance of the flow guide tube, but its key indicators such as thickness, uniformity, and hardness have all met the expected targets. This result marks a phased achievement in the company's independently developed pyrolytic graphite coating equipment and process technology indicators!

Next, the company will continue to focus on the cultivation plan for single champion coatings, concentrating on cutting-edge coating process research and development. Driven by innovation, it will promote equipment iteration and upgrades, continuously improve product performance and service quality, expand scientific research advantages and market competitiveness, and inject strong momentum into the development of China's semiconductor industry.

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