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CETC NEW ENERGY
The company's first silicon carbide coating equipment technical indicators to achieve a major breakthrough!
2024-06-22
On June 22, the company's first silicon carbide coating equipment went through many process optimization and debugging by the technical team, and achieved a major breakthrough in the operation test of the loading process. All technical indexes of the coating products achieved the expected results!
Silicon carbide coating equipment uses chemical vapor deposition to coat the graphite surface to produce a non-volatile solid deposit of SiC thin film or SiC coating on the surface of the substrate. Because SiC coating has the advantages of high thermodynamic stability, high electron mobility, good thermal conductivity, oxidation resistance, corrosion resistance, etc., it is the core component coating of silicon-based semiconductor crystal pulling equipment, silicon carbide chip oxidation equipment, silicon epitaxy, silicon carbide epitaxy, MOCVD equipment, etc. This test successfully achieved technological breakthroughs in key indicators such as SiC coating thickness of epitaxial graphite disc 100μm 15%, coating purity <5ppm, coating density 3.2g/cm3, etc., meeting the current customer and market requirements, improving the company's equipment types and processes, and further improving the company's competitiveness and influence in the market.

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